LITHOGRAPHIC APPARATUS AND METHOD OF CLEANING

A lithographic apparatus comprising: a component (100) subject to contamination (101); and a cleaning system (200), the cleaning system comprising a laser radiation source (201) configured to emit pulses of radiation (202); a beam delivery system (204,205) configured to direct the radiation to a poi...

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Bibliographic Details
Main Authors OSORIO OLIVEROS, Edgar Alberto, VORONINA, Victoria, VAN DE KERKHOF, Marcus Adrianus, VAN DER HORST, Ruud Martinus
Format Patent
LanguageEnglish
French
German
Published 12.08.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
CLADDING OR PLATING BY SOLDERING OR WELDING
CLEANING
CLEANING IN GENERAL
CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING
ELECTROGRAPHY
HOLOGRAPHY
MACHINE TOOLS
MATERIALS THEREFOR
METAL-WORKING NOT OTHERWISE PROVIDED FOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PREVENTION OF FOULING IN GENERAL
SOLDERING OR UNSOLDERING
TRANSPORTING
WELDING
WORKING BY LASER BEAM
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Summary:A lithographic apparatus comprising: a component (100) subject to contamination (101); and a cleaning system (200), the cleaning system comprising a laser radiation source (201) configured to emit pulses of radiation (202); a beam delivery system (204,205) configured to direct the radiation to a point of incidence (P) on the component; and an actuator (206) for controlling the position of the point of incidence with respect to the component.
Bibliography:Application Number: EP20190156092