LITHOGRAPHIC APPARATUS AND METHOD OF CLEANING
A lithographic apparatus comprising: a component (100) subject to contamination (101); and a cleaning system (200), the cleaning system comprising a laser radiation source (201) configured to emit pulses of radiation (202); a beam delivery system (204,205) configured to direct the radiation to a poi...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
12.08.2020
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Subjects | |
Online Access | Get full text |
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Summary: | A lithographic apparatus comprising: a component (100) subject to contamination (101); and a cleaning system (200), the cleaning system comprising a laser radiation source (201) configured to emit pulses of radiation (202); a beam delivery system (204,205) configured to direct the radiation to a point of incidence (P) on the component; and an actuator (206) for controlling the position of the point of incidence with respect to the component. |
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Bibliography: | Application Number: EP20190156092 |