METHOD FOR OBTAINING TRAINING DATA FOR TRAINING A MODEL OF A SEMICONDCUTOR MANUFACTURING PROCESS

Disclosed is a method for obtaining a training data set comprising synthetic metrology data, said training data set being configured for training of a model relating to a manufacturing process for manufacturing an integrated circuit. The method comprises obtaining behavioral property data describing...

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Bibliographic Details
Main Authors WERKMAN, Roy, VERGAIJ-HUIZER, Lydia Marianna
Format Patent
LanguageEnglish
French
German
Published 20.05.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed is a method for obtaining a training data set comprising synthetic metrology data, said training data set being configured for training of a model relating to a manufacturing process for manufacturing an integrated circuit. The method comprises obtaining behavioral property data describing a behavior of a process parameter resultant from the manufacturing process and/or a related tool or effect. Additionally, or alternatively metrology data performed on a structure formed by said manufacturing process and/or a similar manufacturing process may be obtained. Using said behavioral property data and/or metrology data, synthetic metrology data is determined, which describes the effect of variations in said manufacturing process, and/or a related tool or effect on said process parameter. The model is trained using the training data set comprising said synthetic metrology data.
Bibliography:Application Number: EP20180206285