METHOD OF DETERMINING THE CONTRIBUTION OF A PROCESSING APPARATUS TO A SUBSTRATE PARAMETER

Disclosed is a method for determining a contribution of a processing apparatus to a fingerprint of a parameter across a first substrate, the method comprising: obtaining a delta image which relates to the difference between a first pupil image associated with inspection of a first feature on the sub...

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Bibliographic Details
Main Author ANUNCIADO, Roy
Format Patent
LanguageEnglish
French
German
Published 13.05.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:Disclosed is a method for determining a contribution of a processing apparatus to a fingerprint of a parameter across a first substrate, the method comprising: obtaining a delta image which relates to the difference between a first pupil image associated with inspection of a first feature on the substrate and a second pupil image associated with inspection of a second feature on the substrate, wherein the first and second features have different dose sensitivities; determining a rate of change of the difference in response to a variation of a dose used to form said first and second features; and determining the contribution using the determined rate of change and the delta image.
Bibliography:Application Number: EP20180205693