SYSTEM FOR OBSERVING AREAS HAVING A LARGE ASPECT RATIO
The invention relates to a system (10) for observing an extended observation area (1) having a large aspect ratio, comprising a collection optics (2) for receiving light from the observation area (1) and an image sensor (3) having an evaluation area (4). The collection optics (2) is designed to imag...
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Main Authors | , |
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Format | Patent |
Language | English French German |
Published |
06.05.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a system (10) for observing an extended observation area (1) having a large aspect ratio, comprising a collection optics (2) for receiving light from the observation area (1) and an image sensor (3) having an evaluation area (4). The collection optics (2) is designed to image the light from the observation area (1) onto the evaluation area (4) of the image sensor (3), and the collection optics (2) is designed to image portions (1a-1d) of the observation area (1) on a reduced scale, whilst retaining the aspect ratio, onto corresponding portions (4a-4d) of the evaluation area (4). The invention further relates to a method for producing the system (10), in which a parameterised approach is established for the splitter element (5) and the parameters are optimised by means of ray tracing such that a provided portion (1a-1d) of the observation area (1) is imaged onto a provided portion (4a-4d) of the evaluation area (4). |
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Bibliography: | Application Number: EP20180728042 |