METHODS FOR DETECTION AND QUANTIFICATION OF SILICON IN SAMPLES

The present disclosure provides methods and systems for improved detection and/or quantification of selenium (Se) and/or silicon (Si) in samples. In certain embodiment, the methods and systems feature the use of carbon dioxide (CO2) as a reaction gas in a reaction cell chamber, such as a dynamic rea...

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Bibliographic Details
Main Authors BADIEI, Hamid, NEUBAUER, Kenneth
Format Patent
LanguageEnglish
French
German
Published 30.12.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:The present disclosure provides methods and systems for improved detection and/or quantification of selenium (Se) and/or silicon (Si) in samples. In certain embodiment, the methods and systems feature the use of carbon dioxide (CO2) as a reaction gas in a reaction cell chamber, such as a dynamic reaction cell (DRC), of an inductively coupled plasma mass spectrometer (ICP-MS). It is found that the use of CO2 as a reaction gas effectively eliminates (or substantially reduces) interfering ionic species for the analytes Se and Si, particularly in samples with complex matrices, and/or in samples with low levels of analyte, thereby enabling more accurate detection of analyte at lower detection limits and in samples having complex matrices.
Bibliography:Application Number: EP20190196835