METHOD OF MANUFACTURING SEMICONDUCTOR LASER ELEMENT, AND SEMICONDUCTOR LASER DEVICE THEREOF AND GAS ANALYZER

In order to form a reflection film on a rear end facet of a waveguide more easily than conventional, by etching a laminated structure formed on a substrate 2, a plurality of waveguides 3L segmented in a lattice shape are formed, and a reflection film 4 is formed on a surface of each of the waveguide...

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Bibliographic Details
Main Author MATSUHAMA, Makoto
Format Patent
LanguageEnglish
French
German
Published 19.10.2022
Subjects
BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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Summary:In order to form a reflection film on a rear end facet of a waveguide more easily than conventional, by etching a laminated structure formed on a substrate 2, a plurality of waveguides 3L segmented in a lattice shape are formed, and a reflection film 4 is formed on a surface of each of the waveguides 3L for reflecting light in each of the waveguides 3L.
Bibliography:Application Number: EP20190174605