METHOD FOR PERFORMING A MANUFACTURING PROCESS AND ASSOCIATED APPARATUSES
Disclosed is a method for assigning features into at least first features and second features, said first features being for at least one first patterning device configured for use in a lithographic process to form corresponding first structures on a substrate and second features being for at least...
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Main Authors | , , |
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Format | Patent |
Language | English French German |
Published |
01.01.2020
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Subjects | |
Online Access | Get full text |
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Summary: | Disclosed is a method for assigning features into at least first features and second features, said first features being for at least one first patterning device configured for use in a lithographic process to form corresponding first structures on a substrate and second features being for at least one second patterning device configured for use in a lithographic process to form corresponding second structures on a substrate, wherein said method comprises assigning said features into said first features and said second features based on a patterning characteristic of the features. |
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Bibliography: | Application Number: EP20180179450 |