METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

A method for producing a semiconductor device of the present invention includes: step (I) of disposing one or more semiconductor elements each having an active surface, on a thermosetting resin film containing a thermosetting resin composition, such that the thermosetting resin film and the active s...

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Bibliographic Details
Main Authors SUZUKI, Naoya, NONAKA, Toshihisa, KASAHARA, Aya, FUJIMOTO, Daisuke
Format Patent
LanguageEnglish
French
German
Published 16.10.2019
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Summary:A method for producing a semiconductor device of the present invention includes: step (I) of disposing one or more semiconductor elements each having an active surface, on a thermosetting resin film containing a thermosetting resin composition, such that the thermosetting resin film and the active surfaces of the semiconductor elements come into contact; step (II) of encapsulating the semiconductor elements disposed on the thermosetting resin film with a member for semiconductor encapsulation; step (III) of providing openings in the thermosetting resin film or a cured product thereof after step (II), the openings extending to the active surfaces of the semiconductor elements; and step (IV) of filling the openings with a conductor or forming a conductor layer inside the openings.
Bibliography:Application Number: EP20170879259