SYSTEM AND METHOD FOR CONTROLLING EXPOSURE DOSE OF LIGHT SOURCE

A system and method for controlling an exposure dose of a light source are disclosed. The system includes an LED light source (1), a light homogenizer (2), an energy detection unit (31, 32) and an exposure dose control unit (4) coupled to both the LED light source and the energy detection unit. The...

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Bibliographic Details
Main Authors LI, Pingxin, JIANG, Zhiyong, MA, Pengchuan, LI, Meng
Format Patent
LanguageEnglish
French
German
Published 09.10.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A system and method for controlling an exposure dose of a light source are disclosed. The system includes an LED light source (1), a light homogenizer (2), an energy detection unit (31, 32) and an exposure dose control unit (4) coupled to both the LED light source and the energy detection unit. The energy detection unit includes an energy detector (31) corresponding to the LED light source or the light homogenizer and an energy spot sensor (32) corresponding to a wafer. By using the LED light source capable of producing UV light in lieu of an existing mercury lamp, the system is less hazardous and safer by eliminating the risk of discharging hazardous mercury vapor into the environment when the mercury lamp is broken. Moreover, exposure illuminance of the LED light source can be adjusted and the LED light source can be turned on/off under the control of exposure dose control unit to expose the wafer with high dose control accuracy, without needing to use a variable attenuator or an exposure shutter. This reduces the system's complexity and cost and increases its reliability.
Bibliography:Application Number: EP20170876552