METHOD FOR PRODUCING A METAL STAMP FOR EMBOSSING A NANO- AND/OR MICROSTRUCTURE ON A METAL DEVICE AS WELL AS USES THEREOF AND DEVICES MADE THEREWITH

The invention relates to a method for producing a metal stamp for embossing a nano- or microstructure on a metal device (4), comprising the following steps for producing a 3D structured embossing area (3) on the stamp:a) providing a master (30) having a structured surface (30a), and replicating said...

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Bibliographic Details
Main Authors SCHNIEPER, Marc, KALLWEIT, David, KRÄHENBÜHL, Roger, DE WILD, Michael, MAREK, Romy Linda, LUU-DINH, Angélique, SCHNEIDER, Christian
Format Patent
LanguageEnglish
French
German
Published 02.10.2019
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to a method for producing a metal stamp for embossing a nano- or microstructure on a metal device (4), comprising the following steps for producing a 3D structured embossing area (3) on the stamp:a) providing a master (30) having a structured surface (30a), and replicating said master (30a) in the surface of a soft stamp (31);b) forming an imprint (32) on the soft stamp (31a) using a cross-linkable material to form an imprint structured surface (32a), before, while or after contacting an opposite side of the imprint (32) with said surface portion of the metal stamp, and removing said soft-stamp (31) exposing said imprint structured surface (32a);c) etch-opening said surface (32a) using a first set of etching conditions;d) using a second set of etching conditions, different from the first ones, etching the surface of the metal stamp to form said embossing area (3).
Bibliography:Application Number: EP20180164630