POSITIVE PHOTOSENSITIVE COMPOSITION AND THIN FILM TRANSISTOR

The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to the present invention is characterized by...

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Bibliographic Details
Main Authors MANABE, Takao, KITAJIMA, Aki, IDE, Masahito, INARI, Hirofumi, TAHARA, Komei
Format Patent
LanguageEnglish
French
German
Published 09.09.2020
Subjects
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to the present invention is characterized by including (G) a compound having a structure represented by formula (X1) or (X2);(H) a compound having a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; and(D) a photoacid generator,the formulas (X1) and (X2) respectively being:
Bibliography:Application Number: EP20190160493