PATTERN FORMING DEVICE FOR QUARTZ SURFACE

• Main Authors: KO, Suk Whan, YUN, Yang Won, KIM, Chung Man, WON, Ju Yeon, KWAK, Jin Seok, LEE, Jung Sang, LEE, Paul, LEE, Joong Heon
• Format: Patent
• Language: English; French; German
• Published: 25.08.2021
• Subjects: AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING; PERFORMING OPERATIONS; SHAPING CLAY OR OTHER CERAMIC COMPOSITIONS, SLAG, OR MIXTURESCONTAINING CEMENTITIOUS MATERIAL, e.g. PLASTER; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR; SHAPING OR JOINING OF PLASTICS; TRANSPORTING; WORKING CEMENT, CLAY, OR STONE; WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

The present application relates to a pattern forming method for quartz surface and a pattern forming device for quartz surface. According to the pattern forming method for quartz surface of the present application, by comprising a step of forming a pattern and a step of forming a color, it is possible to freely express the color on the pattern simultaneously along with forming the pattern on the quartz surface. And, in addition to these steps, by optionally comprising a step of additionally forming a pattern, it is possible to freely form a desired pattern on the quartz surface, and, by adding long line type patterns on the quartz surface unlike existing conventional quartz surfaces, it is possible to produce the quartz surface showing patterns and textures which are more natural and close to natural stone.