LOW ENERGY ELECTRON BEAM RADIATION SYSTEM THAT GENERATES ELECTRON BEAMS WITH PRECISELY CONTROLLED AND ADJUSTABLE PENETRATION DEPTH USEFUL FOR THERAPEUTIC APPLICATIONS

The invention refers to an electron beam radiation system useful to irradiate a target site with electron beam radiation dose having an adjustable penetration depth, said system comprising:a. an electron beam directed at the target site, said electron beam having an adjustable and controllable elect...

Full description

Saved in:
Bibliographic Details
Main Authors NELSON, James A, KRETCHETOV, Alexandre S, WHITTUM, David H, GOER, Donald A
Format Patent
LanguageEnglish
French
German
Published 05.05.2021
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The invention refers to an electron beam radiation system useful to irradiate a target site with electron beam radiation dose having an adjustable penetration depth, said system comprising:a. an electron beam directed at the target site, said electron beam having an adjustable and controllable electron beam energy adjusted to correspond to a desired penetration depth; andb. a feedback system configured to stabilize the penetration depth of a linearly accelerated, straight through electron beam having an electron beam energy, said system providing a control signal derived from a plurality of sensed electron beam characteristics that in combination correlate to the electron beam energy; andc. wherein the penetration depth is adjusted by presenting selected absorbers of a library of electron beam absorbers configured to provide stepwise tuning of an electron beam in increments of 2 mm or less, wherein at least one electron beam absorber is presented to the electron beam in a manner to reduce the electron beam energy to control the penetration depth of the electron beam dose delivered to the target and/or the penetration depth is adjusted by electronically changing the machine configuration to tune the electron beam energy.
Bibliography:Application Number: EP20170711439