ACCURACY IMPROVEMENTS IN OPTICAL METROLOGY
Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat...
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Main Authors | , , , , , , , , , , , |
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Format | Patent |
Language | English French German |
Published |
08.12.2021
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Subjects | |
Online Access | Get full text |
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Summary: | Methods, metrology modules and target designs are provided, which improve the accuracy of metrology measurements. Methods provide flexible handling of multiple measurement recipes and setups and enable relating them to landscape features that indicate their relation to resonance regions and to flat regions. Clustering of recipes, self-consistency tests, common processing of aggregated measurements, noise reduction, cluster analysis, detailed analysis of the landscape and targets with skewed cells are employed separately or in combination to provide cumulative improvements of measurement accuracy. |
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Bibliography: | Application Number: EP20170757185 |