PELLICLE AND PELLICLE ASSEMBLY

A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one bre...

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Bibliographic Details
Main Authors VAN DER ZANDE, Willem, Joan, VLES, David, Ferdinand, JANSSEN, Paul, BROUNS, Derk, Servatius, Gertruda, NASALEVICH, Maxim, Aleksandrovich, GOVIL, Pradeep K, PÉTER, Mária, VERMEULEN, Johannes, Petrus, Martinus, Bernardus, WILEY, James, Norman, ABEGG, Erik, Achilles, NOTENBOOM, Arnoud, Willem, VAN ZWOL, Pieter-Jan, BENDIKSEN, Aage, VAN DE KERKHOF, Marcus, Adrianus, VOORTHUIJZEN, Willem-Pieter
Format Patent
LanguageEnglish
French
German
Published 16.02.2022
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.
Bibliography:Application Number: EP20160806058