A METHOD FOR MANUFACTURING A MEMBRANE ASSEMBLY AND THE MEMBRANE ASSEMBLY

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, incl...

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Bibliographic Details
Main Authors OOSTERHOFF, Sicco, JANSSEN, Paul, VERBRUGGE, Beatrijs Louise Marie-Joseph Katrien
Format Patent
LanguageEnglish
French
German
Published 04.01.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
GAMMA RAY OR X-RAY MICROSCOPES
HOLOGRAPHY
IRRADIATION DEVICES
MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
MATERIALS THEREFOR
MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES
NANOTECHNOLOGY
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
TRANSPORTING
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Summary:A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.
Bibliography:Application Number: EP20160785484