PROCESS FOR THE ELECTROLYTIC POLISHING OF A METALLIC SUBSTRATE

The present invention is directed a process for the electrolytic polishing of a metallic substrate comprising comprising the steps of (i) providing an electrolyte (EL) in an electrolytic cell comprising at least one electrode, (ii) disposing a metallic substrate as an anode in the electrolytic cell,...

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Bibliographic Details
Main Authors Bagehorn, Sarah, Mertens, Tobias
Format Patent
LanguageEnglish
French
German
Published 27.06.2018
Subjects
APPARATUS THEREFOR
CHEMISTRY
ELECTROLYTIC OR ELECTROPHORETIC PROCESSES
METALLURGY
PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS
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Summary:The present invention is directed a process for the electrolytic polishing of a metallic substrate comprising comprising the steps of (i) providing an electrolyte (EL) in an electrolytic cell comprising at least one electrode, (ii) disposing a metallic substrate as an anode in the electrolytic cell, (iii) applying a current at a voltage of 270 to 315 V from a power source between the at least one electrode and the metallic substrate, and (iv) immersing the metallic substrate in the electrolyte (EL), wherein the electrolyte (EL) comprises (a) at least one acid compound (A), (b) at least one fluoride compound (F), and (c) at least one complexing agent (CA).
Bibliography:Application Number: EP20170209591