MIRROR ARRANGEMENT FOR LITHOGRAPHY EXPOSURE APPARATUS AND OPTICAL SYSTEM COMPRISING MIRROR ARRANGEMENT

• Main Authors: GRUNER, Toralf, HOGERVORST, Richard Petrus, HILD, Kerstin, HAKVOORT, Wouter Bernardus Johannes, RUTGERS, Petrus Theodorus
• Format: Patent
• Language: English; French; German
• Published: 12.06.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; GAMMA RAY OR X-RAY MICROSCOPES; HOLOGRAPHY; IRRADIATION DEVICES; MATERIALS THEREFOR; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR

Mirror elements (2a, 2b) include a substrate (4a, 4b) and a multilayer arrangement (5a, 5b). The multilayer arrangement includes a reflective layer system (6a, 6b) having a radiation entrance surface (7a, 7b) and a piezoelectric layer (8a, 8b) arranged between the radiation entrance surface and the substrate. Each mirror element includes an electrode arrangement (9a, 9b, 9c) associated with the piezoelectric layer. A layer thickness (tp) of the piezoelectric layer is controlled by the electric field generated. An interconnection arrangement (10) electrically interconnects adjacent electrodes of adjacent electrode arrangements. According to one formulation, the interconnection arrangement generates an electric field in a gap region (11) between the adjacent electrodes. According to another, an electric resistance (Ri) of the interconnection arrangement in the gap region is greater than an electric resistance (Rw) of the adjacent electrodes and less than an electric resistance (Rl) of the piezoelectric layers of adjacent electrode arrangements.