FILM FORMING METHOD AND FILM FORMING DEVICE
Provided is a film forming method and the like by which, while implementing a cold spray method, it is possible to inject material powder at a high speed while preventing the material powder from being heated excessively. The film forming method is used for forming a film by spraying material powder...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English French German |
Published |
02.09.2020
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Provided is a film forming method and the like by which, while implementing a cold spray method, it is possible to inject material powder at a high speed while preventing the material powder from being heated excessively. The film forming method is used for forming a film by spraying material powder to deposit on a surface of a base member while the material powder remains in a solid phase state. The film forming method includes: a mixing distance adjusting step of adjusting, in accordance with the type of the material powder, the distance between the position in which the diameter of a through passage is smallest and a mixing position in which the material powder introduced to a nozzle is mixed with gas, the through passage being formed inside the nozzle and being configured so that the diameter thereof first decreases and then increases from a base end toward a distal end; an injecting step of mixing the material powder with the gas in the mixing position, introducing the mixture to the nozzle, accelerating the mixture toward the position in which the diameter is the smallest, and injecting the material powder and the gas from the distal end of the nozzle; and a spraying step of spraying the material powder and the gas injected from the distal end onto the base member. |
---|---|
Bibliography: | Application Number: EP20160814368 |