PHOTOLITHOGRAPHIC PATTERNING OF DEVICES
A method of making a device includes providing a fluorinated material layer over the device substrate having one or more target areas for patterning. One or more lift-off structures are formed at least in part by developing a first pattern of one or more open areas in the fluorinated material layer...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English French German |
Published |
21.11.2018
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | A method of making a device includes providing a fluorinated material layer over the device substrate having one or more target areas for patterning. One or more lift-off structures are formed at least in part by developing a first pattern of one or more open areas in the fluorinated material layer in alignment with the one or more target areas by contact with a developing agent including a fluorinated solvent which dissolves the fluorinated material at a first rate. After patterning, the lift-off structures are removed by contact with a lift-off agent including a fluorinated solvent wherein the lift-off agent dissolves the fluorinated material at a second rate that is at least 150 nm/sec and higher than the first rate. |
---|---|
Bibliography: | Application Number: EP20150828244 |