SUBSTRATE PRE-TREATMENT FOR CONSISTENT GRAPHENE GROWTH BY CHEMICAL DEPOSITION

The present invention relates to a process for preparing graphene, comprising (i) providing in a chemical deposition chamber a substrate which has a surface S1, (ii) subjecting the substrate to a thermal pre-treatment while feeding at least one gaseous or supercritical oxidant into the chemical depo...

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Bibliographic Details
Main Authors SACHDEV, Hermann, SCHWAB, Matthias Georg, BINDER, Axel, STRUDWICK, Andrew-James, MÜLLEN, Klaus, WEBER, Nils-Eike
Format Patent
LanguageEnglish
French
German
Published 12.04.2017
Subjects
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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Summary:The present invention relates to a process for preparing graphene, comprising (i) providing in a chemical deposition chamber a substrate which has a surface S1, (ii) subjecting the substrate to a thermal pre-treatment while feeding at least one gaseous or supercritical oxidant into the chemical deposition chamber so as to bring the surface S1 into contact with the at least one gaseous or supercritical oxidant and obtain a pre-treated surface S2, (iii) preparing graphene on the pre-treated surface S2 by chemical deposition.
Bibliography:Application Number: EP20150720663