HIGH MOLECULAR WEIGHT ALKYL-ALLYL COBALTTRICARBONYL COMPLEXES AND USE THEREOF FOR PREPARING DIELECTRIC THIN FILMS
Precursor for forming a cobalt-containing thin film by a vapor deposition processcorresponding in structure to Formula I: wherein R 1 and R 2 are independently C 2 -C 8 -alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
29.11.2017
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Subjects | |
Online Access | Get full text |
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Summary: | Precursor for forming a cobalt-containing thin film by a vapor deposition processcorresponding in structure to Formula I:
wherein R 1 and R 2 are independently C 2 -C 8 -alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously. |
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Bibliography: | Application Number: EP20160187724 |