HIGH MOLECULAR WEIGHT ALKYL-ALLYL COBALTTRICARBONYL COMPLEXES AND USE THEREOF FOR PREPARING DIELECTRIC THIN FILMS

Precursor for forming a cobalt-containing thin film by a vapor deposition processcorresponding in structure to Formula I: wherein R 1 and R 2 are independently C 2 -C 8 -alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.

Saved in:
Bibliographic Details
Main Authors BOAG, Neil, KANJOLIA, Ravi, ANTHIS, Jeff, ODEDRA, Rajesh
Format Patent
LanguageEnglish
French
German
Published 29.11.2017
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Precursor for forming a cobalt-containing thin film by a vapor deposition processcorresponding in structure to Formula I: wherein R 1 and R 2 are independently C 2 -C 8 -alkyl; x is zero, 1 or 2; and y is zero or 1; wherein both x and y can not be zero simultaneously.
Bibliography:Application Number: EP20160187724