GAS BARRIER LAMINATE

A gas barrier laminate 10 having a very thin metal oxide film (ALD film) 5 formed on an inorganic oxide layer 3 by an atomic layer deposition method, the inorganic oxide layer 3 including a metal oxide or a metal oxynitride that contains at least either Si or Al, and a ratio (d1/d2) of a thickness d...

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Bibliographic Details
Main Authors OBU, Yusuke, KAWAHARA, Naru, OKUYAMA, Shinpei, NANGOU, Shunya
Format Patent
LanguageEnglish
French
German
Published 11.01.2017
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
LAYERED PRODUCTS
LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
METALLURGY
PERFORMING OPERATIONS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
TRANSPORTING
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Summary:A gas barrier laminate 10 having a very thin metal oxide film (ALD film) 5 formed on an inorganic oxide layer 3 by an atomic layer deposition method, the inorganic oxide layer 3 including a metal oxide or a metal oxynitride that contains at least either Si or Al, and a ratio (d1/d2) of a thickness dl of the inorganic oxide layer 3 and a thickness d2 of the ALD film 5 being 3 to 50. The gas barrier laminate features not only a high degree of gas-barrier property but also excellent productivity.
Bibliography:Application Number: EP20150758675