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Summary:A method for use in a physical vapor deposition coating process includes depositing a ceramic coating material (26) from a plume (42) onto at least one substrate (32) to form a ceramic coating (54) thereon, and during the deposition, rotating the at least one substrate (32) at a rotational speed selected with respect to deposition rate of the ceramic coating material (26) onto the at least one substrate (32).
Bibliography:Application Number: EP20150737817