EXTREME ULTRAVIOLET LIGHT SOURCE

A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining pl...

Full description

Saved in:
Bibliographic Details
Main Authors TAO, YEZHENG, STEWART, JOHN TOM, BROWN, DANIEL J.W
Format Patent
LanguageEnglish
French
German
Published 09.11.2016
Subjects
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
Online AccessGet full text

Cover

More Information
Summary:A first remaining plasma that at least partially coincides with a target region is formed; a target including target material in a first spatial distribution to the target region is provided, the target material including material that emits EUV light when converted to plasma; the first remaining plasma and the initial target interact, the interaction rearranging the target material from the first spatial distribution to a shaped target distribution to form a shaped target in the target region, the shaped target including the target material arranged in the shaped spatial distribution; an amplified light beam is directed toward the target region to convert at least some of the target material in the shaped target to a plasma that emits EUV light; and a second remaining plasma is formed in the target region.
Bibliography:Application Number: EP20140825308