DEVICE, MANUFACTURING METHOD, AND EXPOSURE APPARATUS

A device that deforms and deflects a beam, including an aperture layer that includes a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The defle...

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Bibliographic Details
Main Authors Kurokawa, Masaki, Sugatani, Shinji, Yamada, Akio, Takizawa, Masahiro, Iwashita, Ryuma
Format Patent
LanguageEnglish
French
German
Published 15.02.2017
Subjects
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Summary:A device that deforms and deflects a beam, including an aperture layer that includes a first aperture that deforms and passes a beam incident thereto from a first surface side of the device and a deflection layer that passes and deflects the beam that has been passed by the aperture layer. The deflection layer includes a first electrode section that includes a first electrode facing a beam passing space in the deflection layer corresponding to the first aperture and a second electrode section that includes an extending portion that extends toward the beam passing space and is independent from an adjacent layer in the deflection layer and a second electrode that faces the first electrode in a manner to sandwich the beam passing space between the first electrode and an end portion of the second electrode.
Bibliography:Application Number: EP20160166085