COMPOSITIONS CONTAINING LOW DENSITY ETHYLENE-BASED POLYMERS WITH HIGH MELT STRENGTH AND FILMS FORMED FROM THE SAME

The invention provides a composition comprising the following: A) a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and comprising the following properties: a) a Mw(abs) versus I2 relationship: Mw(abs)<A×[(I2)B], where A=5.00×102 (kg/mole)/(dg/min)B,...

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Bibliographic Details
Main Authors BERBEE, Otto, J, DEN DOELDER, Cornelis F. J, KARDOS, Lori, L, KARJALA, Teresa, P
Format Patent
LanguageEnglish
French
German
Published 14.02.2024
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Summary:The invention provides a composition comprising the following: A) a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and comprising the following properties: a) a Mw(abs) versus I2 relationship: Mw(abs)<A×[(I2)B], where A=5.00×102 (kg/mole)/(dg/min)B, and B=−0.40; and b) a MS versus I2 relationship: MS≥C×[(I2)D], where C=13.5 cN/(dg/min)D, and D=−0.55, c) a melt index (I2) from greater than 0.9 to 2.5 g/10 min; and B) a second ethylene-based polymer; and wherein the second ethylene-based polymer has a melt index (I2) from 0.1 to 4.0 g/10 min.
Bibliography:Application Number: EP20140732729