SEMICONDUCTOR DEVICE
A semiconductor device according to an embodiment includes a SiC layer including a first region provided at a surface. The first region satisfies N A - N D < 5 × 10 15 cm -3 when a concentration of a p-type impurity is denoted by N A , whereas a concentration of an n-type impurity is denoted by N...
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Main Authors | , , , |
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Format | Patent |
Language | English French German |
Published |
23.03.2016
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Subjects | |
Online Access | Get full text |
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