SEMICONDUCTOR DEVICE

A semiconductor device according to an embodiment includes a SiC layer including a first region provided at a surface. The first region satisfies N A - N D < 5 × 10 15 cm -3 when a concentration of a p-type impurity is denoted by N A , whereas a concentration of an n-type impurity is denoted by N...

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Bibliographic Details
Main Authors IIJIMA, RYOSUKE, OHASHI, TERUYUKI, SHIMIZU, TATSUO, SHINOHE, TAKASHI
Format Patent
LanguageEnglish
French
German
Published 23.03.2016
Subjects
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