PATTERN STRUCTURE AND METHOD OF MANUFACTURING THE PATTERN STRUCTURE

A pattern structure includes a plurality of pattern structure units arranged substantially on a same plane, where each of the pattern structure units has a first surface and a second surface, which are opposite to each other, and a microstructure is defined on the first surface of each of the patter...

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Bibliographic Details
Main Authors HAHM, SUKGYU, KIM, DONGOUK, BAE, JIHYUN, YOON, ILSUN, OK, JONG G, SHIN, BONGSU, CHUNG, JAESEUNG, LEE, SUNGHOON, PARK, JOONYONG
Format Patent
LanguageEnglish
French
German
Published 20.07.2016
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A pattern structure includes a plurality of pattern structure units arranged substantially on a same plane, where each of the pattern structure units has a first surface and a second surface, which are opposite to each other, and a microstructure is defined on the first surface of each of the pattern structure units, and a flattening layer disposed on the second surface of each of the plurality of pattern structure units, where the flattening layer connects the pattern structure units with each other, and a vertical step difference exists between second surfaces of the pattern structure units.
Bibliography:Application Number: EP20150182217