DEPOSITION CLOUD TOWER WITH ADJUSTABLE FIELD

• Main Authors: KANDOI, SHAMPA, KHANDELWAL, MANISH, STOLAREW BRADLEY, YAN, SUSAN G, NELSON, STEVEN M
• Format: Patent
• Language: English; French; German
• Published: 27.07.2016
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

A cloud tower (11) receives microscopic particles (18) impelled by an inert gas (17) for deposition on a porous substrate (29) having vacuum (34) disposed on opposite side. To alter the size and/or shape of the deposition field without changing the entire tower structure, a pair of flaps (43, 44) are hinged (47, 48) on one side or on a pair of opposed sides of the cloud primary tower. Another embodiment places selectable tower inserts (36, 38) within the primary tower structure, fitting therein and sealing thereto.