METHOD AND APPARATUS FOR FORMING ON A SUBSTRATE A PATTERN OF A MATERIAL

In a method and an apparatus for forming on a substrate (214) a pattern of a material, a material layer is provided on an intermediate carrier (204) and an adhesive layer is provided on the material layer, wherein at least one of the material layer or the adhesive layer comprises a pattern correspon...

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Bibliographic Details
Main Authors NEGREANU, Eyal, KELLA, Dror, AMIR, Gidi, GRINWALD, Yaron, SANDLER, Mark
Format Patent
LanguageEnglish
French
German
Published 07.10.2020
Subjects
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Summary:In a method and an apparatus for forming on a substrate (214) a pattern of a material, a material layer is provided on an intermediate carrier (204) and an adhesive layer is provided on the material layer, wherein at least one of the material layer or the adhesive layer comprises a pattern corresponding to the pattern to be formed on the substrate (214). The material is transferred to the substrate (214) with the adhesive fixing the material to a surface (216) of the substrate (214).
Bibliography:Application Number: EP20120780738