THIN FILM TRANSISTOR AND MANUFACTURING METHOD THEREOF, ARRAY SUBSTRATE AND DISPLAY DEVICE

• Main Authors: DUAN, Longlong, DONG, Zhiyuan, FANG, Weihua, PENG, Liang, ZHANG, Yunqi, PARK, Sangsoo, YU, Liumin, HUANG, Daowu, XIAO, Liang, ZHANG, Xunze, SHEN, Yanrui, WANG, Jian
• Format: Patent
• Language: English; French; German
• Published: 04.12.2019
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The present invention provides a thin film transistor and a manufacturing method thereof, an array substrate, and a display apparatus, which can solve the problem that the performance of the thin film transistor in the prior art is lowered when the semiconductor active region is converted into a doped semiconductor active region so that the lattices of the semiconductor active region itself are destroyed by the doped impurity ions. The thin film transistor of the present invention comprises a gate, a gate insulation layer, a semiconductor active region, and a source and a drain connected with the semiconductor active region, and further comprises a surface charge transfer layer in contact with the semiconductor active region, the surface charge transfer layer is located above or below the semiconductor active region, and is used for causing the semiconductor active region to generate a large number of holes or electrons therein without changing the lattice structure of the semiconductor active region. In the thin film transistor, charge transfer occurs between the semiconductor active region and the surface charge transfer layer so that the doped semiconductor active region is formed, thus the performance of the thin film transistor is significantly improved.