LITHOGRAPHIC OFFSET INKS WITH WATER AND FILLER CONTENT

• Main Authors: KRISHNAN, Ramasamy, NEWTON, Jeff, JUNG, Reiner, DETTLING, Adelbert, GAUDL, Kai-Uwe Walter, SCHWARTZ, Russell, KELLER, Lars, BILGIÇ, Cumhur, GATTERMAYER, Jochen, JONES, Jeff
• Format: Patent
• Language: English; French; German
• Published: 01.09.2021
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; USE OF MATERIALS THEREFOR; WOODSTAINS

Lithographic printing inks are described, which are characterized by the inclusion of both water, in a substantially emulsified form, and inorganic filler. Inks of the present invention show improved printing properties in offset lithography, including improved transfer, reduced piling and improved mileage. They also offer cost advantages over currently available inks and the ability to minimize or eliminate entirely mineral oil from their compositions. The inks of the present invention may be used in both web-based print processes including coldset and heatset, as well as in sheetfed printing. The inks may be dried to a durable ink film at ambient temperature, with thermal energy or with actinic or electron beam radiation, or with any combination thereof.