Scanning probe nanolithography system and method

A scanning probe nanolithography system comprising a probe to create nanostructures line (60) by line through writing said nanostructures (74) pixel by pixel along lines (61) on a sample. A positioning system is adapted to provide a positioning of the probe at a sequence of predetermined positions t...

Full description

Saved in:
Bibliographic Details
Main Authors HOLZNER, FELIX, PAUL, PHILIP, ZIENTEK, MICHAL, RAWLINGS, COLIN, KNOLL, ARMIN
Format Patent
LanguageEnglish
French
German
Published 18.03.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Online AccessGet full text

Cover

More Information
Summary:A scanning probe nanolithography system comprising a probe to create nanostructures line (60) by line through writing said nanostructures (74) pixel by pixel along lines (61) on a sample. A positioning system is adapted to provide a positioning of the probe at a sequence of predetermined positions to the sample and its surface towards the probe and a control unit 50 is provided to control the positioning system for positioning the probe for a pixelwise writing of said lines (61) through a writing unit. It further comprises a sensor unit adapted to detect a predetermined property of the written nanostructure (74), the sensor unit being connected to the control unit to adapt the control signals to be provided to the writing unit for writing the following line (61; 62) based on the measured signals (65; 66) of the predetermined property.
Bibliography:Application Number: EP20130184651