METHOD OF PROCESSING A PHOTOSENSITIVE STRUCTURE

The invention provides a method of applying a coating material to a photosensitive material to form a surface coating, wherein the photosensitive material, before or after curing, and the surface coating are soluble in a first liquid, the method comprising applying the coating material as a dispersi...

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Bibliographic Details
Main Authors BENTLEY, PHILIP GARETH, BROOKS, JONATHON, ROBINSON, MARTYN
Format Patent
LanguageEnglish
French
German
Published 07.01.2015
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention provides a method of applying a coating material to a photosensitive material to form a surface coating, wherein the photosensitive material, before or after curing, and the surface coating are soluble in a first liquid, the method comprising applying the coating material as a dispersion in a second liquid in which the photosensitive material is insoluble. By applying the coating material as a dispersion in a liquid in which the photosensitive material is insoluble, the photosensitive material is not disrupted.
Bibliography:Application Number: EP20130700947