GAS SUPPLY METHOD AND GAS SUPPLY EQUIPMENT

• Main Authors: NAGURA, KENJI, TAKAGI, HITOSHI
• Format: Patent
• Language: English; French; German
• Published: 05.11.2014
• Subjects: BLASTING; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; HEATING; LIGHTING; MECHANICAL ENGINEERING; STORING OF DISTRIBUTING GASES OR LIQUIDS; VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES; WEAPONS

A gas-filling device (1) in which the design pressure of a pressure accumulator can be reduced while downsizing a compressor includes a compressor (4) and a pressure accumulator (5). In advance, a relationship between a filling pressure and a target flow rate is determined in accordance with the volume of a tank (3), the filling pressure is detected, and the target flow rate is determined. A flow rate of a gas to be supplied into the tank (3) is controlled according to the target flow rate. In a case where the target flow rate is equal to or less than a maximum discharge flow rate of the compressor (4), the gas is supplied to the tank (3) only from the compressor (4). In a case where the target flow rate is greater than the maximum discharge flow rate, the gas is supplied to the tank (3) from the compressor (4) and the pressure accumulator (5).