INK FOR DIRECT PLATEMAKING OF NANOMETER MATERIAL PRINTING AND METHOD FOR PREPARING SAME

An ink used for direct platemaking techniques for nanometer material printing and a method for preparing same. Of the baseline total amount of the ink, 5 to 30 wt% is of film-forming resin, 0.01 to 5 wt% is of nanometer or micrometer dye, 30 to 60 wt% is of organic solvent, 0.01 to 5 wt% is of humec...

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Bibliographic Details
Main Authors KUANG, MINXUAN, ZHOU, HAIHUA, SONG, YANLIN
Format Patent
LanguageEnglish
French
German
Published 12.11.2014
Subjects
ADHESIVES
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
FILLING PASTES
INKS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
POLISHES
USE OF MATERIALS THEREFOR
WOODSTAINS
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Summary:An ink used for direct platemaking techniques for nanometer material printing and a method for preparing same. Of the baseline total amount of the ink, 5 to 30 wt% is of film-forming resin, 0.01 to 5 wt% is of nanometer or micrometer dye, 30 to 60 wt% is of organic solvent, 0.01 to 5 wt% is of humectant, and water provides the balance; these ingredients are stirred and mixed at room temperature, and after the film-forming resin is completely dissolved, impurities and/or insoluble substances in the present invention are removed by means of multi-level filtering, and the obtained filtrate is the present ink. The ink in the present invention is sprayed on a metal base material surface by an inkjet printer o form a printing pattern which, after curing, can be directly printed on the machine, thus reducing chemical pollution and post-processing processes, while a press run of the printing plate can be up to 100,000 copies at a resolution of up to 175 lpi.
Bibliography:Application Number: EP20120792281