ENCAPSULATION OF ELECTRODES IN SOLID MEDIA FOR USE IN CONJUNCTION WITH HIGH VOLTAGE ISOLATION PROVIDED BY FLUID

An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a s...

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Bibliographic Details
Main Authors PARKER, N. William, GRAUPERA, Anthony, WELLS, Andrew B, MCGINN, James B, UTLAUT, Mark W, KELLOGG, Sean
Format Patent
LanguageEnglish
French
German
Published 25.07.2018
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
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Summary:An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
Bibliography:Application Number: EP20120803226