ENCAPSULATION OF ELECTRODES IN SOLID MEDIA FOR USE IN CONJUNCTION WITH FLUID HIGH VOLTAGE ISOLATION

An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a s...

Full description

Saved in:
Bibliographic Details
Main Authors GRAUPERA, ANTHONY, UTLAUT, MARK W, WELLS, ANDREW B, PARKER, N. WILLIAM, KELLOGG, SEAN, MCGINN, JAMES B
Format Patent
LanguageEnglish
French
German
Published 07.01.2015
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PLASMA TECHNIQUE
PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS
PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS
Online AccessGet full text

Cover

More Information
Summary:An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.
Bibliography:Application Number: EP20120803226