SUBSTRATE WITH THOUGH ELECTRODE AND METHOD FOR PRODUCING SAME

A method for producing a substrate with through-electrode includes the steps of: forming recesses 21 or through-holes 21B in either one of a silicon substrate 51 and a glass substrate 54; forming protrusions 52 in the other substrate; laying the silicon substrate 51 and glass substrate 54 on each ot...

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Main Authors HOZUMI, JUNICHI, TOMOIDA, RYO, OKUMURA, SHIN, NAKATANI, TOMOHIRO, TAURA, TAKUMI
Format Patent
LanguageEnglish
French
German
Published 04.12.2013
Subjects
BASIC ELECTRIC ELEMENTS
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GLASS
INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
JOINING GLASS TO GLASS OR OTHER MATERIALS
MEASURING
MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK
METALLURGY
MINERAL OR SLAG WOOL
PHYSICS
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
TESTING
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Summary:A method for producing a substrate with through-electrode includes the steps of: forming recesses 21 or through-holes 21B in either one of a silicon substrate 51 and a glass substrate 54; forming protrusions 52 in the other substrate; laying the silicon substrate 51 and glass substrate 54 on each other so that the protrusions 52 are inserted in the respective recesses 21 or through-holes 21B; and bonding the silicon substrate 51 and the glass substrate 54 to each other.
Bibliography:Application Number: EP20120739563