APPARATUS AND METHOD FOR COATING GLASS SUBSTRATE

An apparatus and method for coating a substrate using one or more liquid raw materials, includes: at least one atomizer for atomizing the one or more liquid raw materials into droplets, charging means for electrically charging the droplets during or after the atomization and a deposition chamber in...

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Bibliographic Details
Main Authors RAJALA, MARKKU, KAUPPINEN, SAMI
Format Patent
LanguageEnglish
French
German
Published 30.04.2014
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Summary:An apparatus and method for coating a substrate using one or more liquid raw materials, includes: at least one atomizer for atomizing the one or more liquid raw materials into droplets, charging means for electrically charging the droplets during or after the atomization and a deposition chamber in which the droplets are deposited on the substrate, the deposition chamber being provided with one or more electric fields for guiding the electrically charged droplets on the substrate. According to the invention there is a charging chamber arranged upstream of the deposition chamber and provided with charging means for electrically charging the droplets.
Bibliography:Application Number: EP20100733020