DETERMINATION OF MATERIAL OPTICAL PROPERTIES FOR OPTICAL METROLOGY OF STRUCTURES

Methods of determining a material optical property for optical metrology of a structure is described. One method includes simulating a set of diffraction orders for a grating structure based on two or more azimuth angles and on one or more angles of incidence. A simulated spectrum is provided based...

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Bibliographic Details
Main Authors YANG, Weidong, MADSEN, Jonathan, Michael
Format Patent
LanguageEnglish
French
German
Published 08.07.2020
Subjects
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
PHYSICS
TESTING
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES
TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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Summary:Methods of determining a material optical property for optical metrology of a structure is described. One method includes simulating a set of diffraction orders for a grating structure based on two or more azimuth angles and on one or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders. Another method includes simulating a set of diffraction orders for a grating structure based on two or more angles of incidence. A simulated spectrum is provided based on the set of diffraction orders.
Bibliography:Application Number: EP20110778115