Method for making optically effective surface relief microstructures
Method for making a mask which has a microstructure of first and second zones of different transparency, which comprises the steps depositing on a layer (42) of a mask material a film (43) with a topologically structured corrugated surface structure, reducing the thickness of the film (43) until the...
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Main Author | |
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Format | Patent |
Language | English French German |
Published |
06.03.2013
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Subjects | |
Online Access | Get full text |
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Summary: | Method for making a mask which has a microstructure of first and second zones of different transparency, which comprises the steps depositing on a layer (42) of a mask material a film (43) with a topologically structured corrugated surface structure, reducing the thickness of the film (43) until the material of the film in lower zones of the corrugated surface is cleared away and parts (44) of the underlying mask material are set free, and removing the parts (44) of the mask that are set free. |
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Bibliography: | Application Number: EP20120191370 |