METHOD FOR COATING A SUBSTRATE INSIDE A VACUUM CHAMBER BY MEANS OF PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION

• Main Authors: FAHLAND, MATTHIAS, FAHLTEICH, JOHN, BUNK, SEBASTIAN, ZEIBE, RAINER, BLÜTHNER, RALF
• Format: Patent
• Language: English; French; German
• Published: 28.09.2016
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a device for depositing a layer on a substrate (2) inside a vacuum chamber (1) by means of plasma-assisted chemical vapor deposition, comprising at least one inlet (3) for introducing at least one gas into the vacuum chamber (1) and at least one magnetron (4) equipped with a target (5; 9) for producing a plasma, wherein the target (5; 9) has a temperature of at least 300 °C at least in one region during the deposition of the layer.