METHOD FOR VACUUM-COATING A SUBSTRATE WITH A TRANSPARENT, CONDUCTIVE METAL ALLOY OXIDE AND A TRANSPARENT, CONDUCTIVE LAYER MADE OF A METAL ALLOY OXIDE

• Main Authors: SCHÖNBERGER, Alexander, SCHÖNBERGER, Waldemar, STRAACH, Steffen, SCHILLER, Nicolas, FAHLAND, Matthias
• Format: Patent
• Language: English; French; German
• Published: 15.02.2017
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a method for depositing a transparent, conductive layer, comprising a host material and a doping material, on a substrate (2) within a vacuum chamber (1), wherein the host material is made of zinc oxide or indium oxide and the doping material comprises an oxide of at least one of the metallic or semimetallic elements from the main group III or IV, wherein oxygen and a precursor are introduced into the vacuum chamber (1) while the host material is being deposited by means of a physical vapor deposition process, wherein the precursor contains the at least one element from the main group III or IV and the concentration of the doping material has a gradient in the course of the layer thickness. The invention further relates to a transparent, conductive layer made of a metal alloy oxide.