MOLDING COMPOUND ON THE BASIS OF A COPOLYAMIDE CONTAINING TEREPHTHALIC ACID AND TRIMETHYLHEXAMETHYLENE DIAMINE UNITS

A molding compound, containing at least 30% by weight of a copolyamide, which is derived from the following monomers: a) 50 to 95 mole percent of the combination of a diamine, selected from the group consisting of 1,9-nonane diamine, 1,10-decane diamine, 1,11-undecane diamine and 1,12-dodecane diami...

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Bibliographic Details
Main Authors PAWLIK, Andreas, ROOS, Martin, HÄGER, Harald, BAUMANN, Franz-Erich
Format Patent
LanguageEnglish
French
German
Published 03.10.2018
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Summary:A molding compound, containing at least 30% by weight of a copolyamide, which is derived from the following monomers: a) 50 to 95 mole percent of the combination of a diamine, selected from the group consisting of 1,9-nonane diamine, 1,10-decane diamine, 1,11-undecane diamine and 1,12-dodecane diamine, and terephthalic acid, and b) 5 to 50 mole percent of the combination of a diamine, selected from the group consisting of 2,2,4-trimethylhexamethylene diamine, 2,4,4-trimethylhexamethylene diamine, and mixtures thereof, and terephthalic acid. The copolyamide is crystalline and has low water absorption.
Bibliography:Application Number: EP20100734083