MULTI-COLUMN ELECTRON BEAM LITHOGRAPHY SYSTEM AND ELECTRON BEAM ORBIT ADJUSTING METHOD THEREOF

• Main Author: YAMADA, AKIO
• Format: Patent
• Language: English; French; German
• Published: 23.11.2011
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; PERFORMING OPERATIONS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TRANSPORTING

A multi-column electron beam lithography apparatus includes multiple columns, each including a mask having several aperture patterns; a selective deflector provided on the mask's incident side to deflect an electron beam to select an aperture pattern; a bending back deflector provided on the ma...