Thin film manufacturing method and thin film element

A thin film manufacturing method includes the steps of a) placing a substrate (120) including a first main surface inside a reaction container (110) filled with a raw material solution (112), and b) forming a thin film (130) by irradiating a light in the direction of the first main surface of the su...

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Bibliographic Details
Main Authors OHTA, EIICHI, YAGI, MASAHIRO
Format Patent
LanguageEnglish
French
German
Published 05.12.2012
Subjects
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
DIFFUSION TREATMENT OF METALLIC MATERIAL
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
METALLURGY
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:A thin film manufacturing method includes the steps of a) placing a substrate (120) including a first main surface inside a reaction container (110) filled with a raw material solution (112), and b) forming a thin film (130) by irradiating a light in the direction of the first main surface of the substrate (120).
Bibliography:Application Number: EP20100252008