Insulated gate semiconductor device and method of manufacturing the same
A semiconductor device comprises a substrate including a first region and a second region of a first conductivity type and a third region between the first and second regions of a second conductivity type opposite to the first conductivity type, and being covered by a dielectric layer. A plurality o...
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Main Authors | , |
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Format | Patent |
Language | English French German |
Published |
04.06.2014
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Subjects | |
Online Access | Get full text |
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