Insulated gate semiconductor device and method of manufacturing the same

A semiconductor device comprises a substrate including a first region and a second region of a first conductivity type and a third region between the first and second regions of a second conductivity type opposite to the first conductivity type, and being covered by a dielectric layer. A plurality o...

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Bibliographic Details
Main Authors HERINGA, ANCO, SONSKY, JAN
Format Patent
LanguageEnglish
French
German
Published 04.06.2014
Subjects
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